|
|
|
Welcome to GlobalSpec - a trusted source for engineers and industrial professionals.
Search GlobalSpec to find resist ashing-related products, suppliers, datasheets and CAD.
|
The Engineering Toolbar
The Ultimate Resource for Engineering and Technical Research. (Learn More) |
...ashing, plasma cleaning, sputter etching, sputter precleaning or ion milling are processes that use plasma to remove layers of material from a substrate or wafer for cleaning purposes. In rapid thermal processing (RTP), silicon wafers are rapidly... Search by Specification | Learn More
...the unit can operate. Choices for configuration for industrial furnaces include ashing, box or muffle, bottom loading, top loading, tube, bench or cabinet, belt, continuous or conveying, pusher, and walk-in or truck-in. Ashing is also referred... Search by Specification | Learn More
...of the substrate or wafer. Plasma ashing, plasma cleaning, sputter etching, sputter precleaning or ion milling are processes that use plasma to remove layers of material from a substrate or wafer for cleaning purposes. In rapid thermal processing (RTP), silicon... Search by Specification | Learn More
Waxes and wax compounds are high molecular weight organic materials similar to fats and oils, except waxes are solid at room temperature (melting point above 45 C). Waxes are used in sealers, polishes, inks, lubricants, binders and investment casting. Learn More
...steels are straight-chromium, 400 series metals that cannot be hardened by heat treatment, and only moderately hardened by cold working. They are magnetic, have good ductility, and resist corrosion and oxidation. Martensitic stainless steels, another... Search by Specification | Learn More
Ferrous metals and alloys are based on iron and include carbon steels, alloy steels, stainless steels, cast iron, cast steel, maraging steel, and specialty or proprietary iron-based alloys. Search by Specification | Learn More
Resistors are electrical components that oppose the flow of either direct or alternating current. They are used to protect, operate, or control circuits. Search by Specification | Learn More
Thin film materials are high purity materials and chemicals such as precursor gases, sputtering targets or evaporation filaments used to form or modify thin film deposits and substrates. Learn More
Electroceramics are ceramic materials that have been specially formulated for specific electrical, electro-magnetic, or optical properties. They include dielectric ceramics, electrostrictive ceramics, ferrite ceramics, garnets (ferromagnets), and piezoelectric ceramics. Search by Specification | Learn More
...important to consider when searching for laboratory furnaces. Choices for configuration for laboratory furnaces include ashing, box or muffle, bottom loading, top loading, and tube. Ashing is also referred to as charring; this is the step in a graphite... Search by Specification | Learn More
...vacuum (< 10-8 torr), and elevated pressures (> 760 torr). Common configurations for vacuum furnaces include ashing, box or muffle, bottom loading, top loading, tube, bench or cabinet, continuous or conveying, and walk-in or truck-in. Ashing... Search by Specification | Learn More
Industrial ceramic materials are non-metallic, inorganic compounds that include oxides, carbides, or nitrides. They have high melting points, low wear resistance, and a wide range of electrical properties. Search by Specification | Learn More
Specialty ceramics include nitrides, borides, carbon or graphite and silicides as well as other specialized non-metallic compounds. Learn More
Nonferrous metals and nonferrous alloys are not based on iron and include alloys of aluminum, copper, titanium, zinc, nickel, cobalt, tungsten, precious metals, refractory metals. Learn More
Solders include low melting point metal alloys usually in wire, powder, preform or paste forms. Solders are metal alloys with low melting points that are used to join metals together. Search by Specification | Learn More
|
|
||||||||
Dry Chlorinated Thermal Oxide- Available for MOS Rogue Valley Microdevices, Inc.
TriTec MSF-Tri-Technology Multi-Spectral Finishing ELCAN Optical Technologies
Nitrogen Annealing Available including Forming Gas Rogue Valley Microdevices, Inc.
PVD Metals, Sputtered Cu, Ti, Ta, Al, Ni, W, Cr Rogue Valley Microdevices, Inc.
Evaporated Metal Stacks-Cr/Au, Ti/Au, Ti/Pt, Cr/Pt Rogue Valley Microdevices, Inc.
PECVD Silicon Carbide Thin Film for Silicon Wafers Rogue Valley Microdevices, Inc.
|
This range of furnaces comprising three models offers an extensive choice of dedicated ashing/burn off furnaces. (read more)
Parker PAGE offers High Temperature Food Processing hoses for the food and beverage industry in several types and sizes. (read more)
Type HS compares very favorably from a strength standpoint with any heat resisting metal and is recommended for applications at temperatures up to 1800 degrees F under both conditions of cyclic and continuous heating without thermal shock. (read more)
Type W is a series of austenitic-martensitic white irons characterized by high hardness and relatively good impact strength. (read more)
Type CC is a general utility material providing good corrosive resistance. It can be used for slightly acid solutions, alkali solutions at temperatures up to 150°F and concentrated sulfuric acid at temperatures up to 250°F... (read more)
BEI's industry standard H25 and H20 incremental rotary encoders are now available with a stainless steel housing option. Harsh industrial applications often expose plant equipment to caustic chemical materials, resulting in premature deterioration and failure. (read more)
Custom fabricated cellular silicone gaskets and seals for critical applications, especially where people might be exposed in the event of a fire, are being introduced by Interstate Specialty Products, Inc. of Sutton, MA. (read more)
PA&E's explosive metal bonding process creates high-strength bi-metallic transitions that join dissimilar metals together at the molecular level. For the maritime industry, this means high-strength, critical parts can be manufactured incorporating stainless steel/aluminum bi-metallic transitions and welded directly to an aluminum structure without generating galvanic corrosion. (read more)
Formulated with proprietary technology, Simriz 499 offers excellent resistance to solvents and acids
Simrit is expanding its Simriz® brand of perfluoroelastomer compounds with the introduction of the newly formulated Simriz 499 material. The latest in the Simriz line of proprietary materials, Simriz 499 was specifically developed to combine plasma resistance, broad chemical resist...
(read more)
Isolast® Fab Range™ offers the ultimate in elastomer sealing. These high-performance Perfluoroelastomers (FFKM) are virtually inert and demonstrate almost universal chemical compatibility while operating at continuous temperatures up to +325°C/+617°F. (read more)
|
µASH 8100W Resist Ashing Equipment | SHIBATEC Home > Products > Semiconductor Manufacturing Equipment > Resist Ashing Equipment Resist Ashing Equipment Single Wafer Wet Cleaning Equipment See Shibatec Information |
|
|
RPA300 Remote Plasma Ashing Equipment | SHIBATEC Performs damage-free ashing of the resist on porous low-k film. Resist Ashing Equipment Single Wafer Wet Cleaning Equipment See Shibatec Information |
|
|
Photo-Resist Ashing Byatmospheric Pressure Plasma Photo-Resist Ashing Byatmospheric Pressure Plasma |
|
|
Thin oxide damage by plasma etching and ashing processes International Item Title: Thin oxide damage by plasma etching and ashing processes ISBN: 0-7803-0473-X Publisher Name: IEEE Publisher Location: New |
|
|
Talk:Plasma ashing - Wikipedia, the free encyclopedia Furthermore, the use of "Plasma Ashing " is not limited to resist removal in semiconductors. |
|
|
Photolithography - Wikipedia, the free encyclopedia from a photomask to a light-sensitive chemical (photoresist, or simply "resist") on the substrate. |
|
|
Chamber contamination in ashing processes of ion-implanted... Higher implant dose, energy, and ashing temperature also caused more popping of the resist. |
|
|
Chamber contamination in ashing processes of ion-implanted... Higher implant dose, energy, and ashing temperature also caused more popping of the resist. |
|
|
No Title An ashing-treated resist was analyzed by x-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR) in order to |
|
|
Integrated ashing and implant annealing method using ozone... Abstract: After ion implantation, thermal ashing is performed using ozone at a pressure of between about 0.01 to about 1000 Torr at below 1000° |